Fujifilm Electronic Materials would like to invite you to our Advanced Lithography Workshop 2023, which will take place in Italy and Germany. We revert back to our two-half day format. Of course, we would be happy to see you presenting your resolved or unresolved challenges and findings. Please feel free to reserve a slot with us.
Tuesday and Wednesday, 19/20 September 2023
Devero Hotel & SPA
Largo Kennedy 1
20873 Cavenago di Brianza (MB), Italy
Thursday and Friday, 21/22 September 2023
Grundbesitz Hellerau
Moritzburger Weg 67
01109 Dresden, Germany
Do you feel like registering? Please use our link to the registration engine.
Final agendas will be avaliabe in the week of the workshop.
|
SPEAKER |
COMPANY |
TITLE |
|
Anke Wörz |
TDK-Micronas |
Challenges of switching to a modern resist |
|
Seiya Masuda |
Fujifilm Electronic Materials |
Magnetic material R&D for the planar inductor in 3D-IC package |
|
Brid Connolly |
Toppan Photomask |
Manufacturing of NIL Masters for AR/VR Applications and Metalenses using Photomask Technology |
|
Douglas Guerrero |
Brewer Science |
Multilayer materials for KrF lithography |
|
Lander Verstraete |
IMEC |
Directed Self-Assembly for Rectification of Extreme Ultraviolet Lithography Patterns: Exploring the Benefits and Challenges. |
|
Ksenija Varga |
EVG Group |
Dynamic Die Annotations Patterning by Maskless Exposure on 7th Generation Color Mosaics |
|
Danilo De Simone |
IMEC |
EUV lithography patterning towards device nano scaling |
|
Keita Kato |
Fujifilm Electronic Materials |
A novel formulated developer for negative-tone imaging with EUV exposure to improve chemical stochastic |
|
Paper list work in progress and will be updated... |
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Please find a few nice memory shots from the workshop in 2022 here below.
Get ready for the hands-on in 2023!
To access the presentations from 2022 please login with the provided password:
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