FUJIFILM Advanced Lithography Workshop 2026

Fujifilm - Value from innovation

Fujifilm - Electronic Materials

Registration Open

We’re excited to remind you that the event is just around the corner. There is still time to register and finalize your travel arrangements.

Do you feel like registering?
Please use our registration form

17. - 18. September 2026

Grundbesitz Hellerau
Moritzburger Weg 67
01109 Dresden, Germany

The event will follow our familiar two-half-day format.

We look forward to your valuable contributions and to welcoming you at the workshop.

Our valued sponsors:

Fujifilm - Sponsors



Please take a first look at our preliminary agenda, which is still subject to change.


Day 1 - 17. September 2026

TIME

SPEAKER

COMPANY

TITLE

13:00

Workshop Team

Fujifilm

Introduction

SESSION 1: Think Inside, Outside and I-LINE the Box

Chaired by Eva-Maria Hof (Brewer Science)

13:15

Michael Sternad / Philipp Horn

Infineon

Intensity-time dependent exposure effects on Durimide 7520

13:40

Pierre Sixt

CEA-Leti

Comparison between LTC polyimide versions

14:05

Felix Buchta

Infineon

The Odyssey - Qualifying a Photoresist in High- Volume Manufacturing

14:30

Break

SESSION 2: Throughput, Throughput, Throughput

Chaired by Jean-Luc Peyre (TEL)

15:00

Yvonne Bergmann

Bosch

Smart Maintenance for Uptime Improvement of Clustered Lithography Tools

15:25

Stewart Robertson

KLA

PROLITH: Solving high volume fab issues using rigorous physical lithography simulation

15:50

Kimberly Van Acker

FFEM

Logistic efforts on urgent orders

16:15

Hands-on with Geert

19:00

Dinner & Networking



Day 2 - 18. September 2026

TIME

SPEAKER

COMPANY

TITLE

09:00

Workshop Team

Fujifilm

Introduction

SESSION 3: Breaking Through ADVANCED RESISTance

Chaired by Martin Mazur

09:05

Danilo De Simone

IMEC

Advances in PFAS-Free Lithographic Materials at imec

09:30

Nishiki Fujimaki

FFEM

Challenges and progress of PFAS alternatives for ArF resist

09:55

Carolina Morgado

Brewer Science

Thick transparent substrates: A Novel Application for KrF Multilayer

10:20

Break

SESSION 4: Packed with Potential

Chaired by Tetyana Shapoval (KLA)

10:50

Marcus Wöhrmann

Fraunhofer IZM

Thin-Film Polymers for Advanced Packaging: Enabling Multi-Layer Routing and Polymer Hybrid Bonding.

11:20

Jean-Luc Peyre

TEL

Coater and Developer for Advanced Packaging

11:45

Yohsuke Watanabe

FFEM

Wave Control Material Introduction

Closing remarks



Never stop imagining imaging!

Please find a few nice memory shots from the workshop in 2025 here below.

Get ready for the hands-on in 2026!

Imprint

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