Fujifilm Electronic Materials would like to invite you to our Advanced Lithography Workshop 2022, which will take place on Thursday, 15 September 2022. As last year, it will be again an event in hybrid format, i.e. partially on-site and virtual. The venue for the on-site event will be in Dresden, Germany. We kindly ask you to mark that date in your calendar and will come back to you in the coming weeks with all relevant updates. Of course, we would be happy to see you presenting your resolved or unresolved challenges and findings. Please feel free to reserve a slot with us.
Thu. 15 September 2022
Kunsthalle (neonworx)
Kraftwerk Mitte 5-7
01067 Dresden, Germany
Do you feel like registering? Please use our link to the registration engine.
With the current restrictions in place, we hope you understand that we have to maintain a very flexible event. While all our speakers have been nominated as of today, our agenda will continue to evolve to a more detailed list over the next few weeks. Thank you for your understanding and please check frequently!
|
TIME |
SPEAKER |
COMPANY |
TITLE |
|
13:00 |
FUJIFILM Workshop Team |
FUJIFILM Electronic Materials |
Introduction |
|
SESSION 1 - Chaired by Christoph Hohle (Fraunhofer IPMS) |
|||
|
13:05 |
Michael Steiniger |
Vishay Itzehoe |
LTC 9320: Process Setup and Optimization |
|
13:25 |
Niels Van Herck |
FUJIFILM Electronic Materials |
Enabling Polymers for Improved Resolution |
|
13:45 |
Ksenija Varga |
EV Group Europe |
The Future of Lithography for Advanced Packaging is Digital |
|
14:00 |
Audrey Berthoud |
STMicroelectronics, Grenoble |
New FUJIFILM resists qualification for smaller colored pixel RGB. |
|
14:15 |
Hirotaka Takishita |
FUJIFILM Electronic Materials |
New Low-Reflectivity Black Material With High Optical Density |
|
14:35 |
Break |
||
|
SESSION 2 - Chaired by Sven Muehle (Globalfoundries) |
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|
15:00 |
Valentina Dall'Asta |
STMicroelectronics, Agrate |
Post-etch aluminum corrosions: the insertion of a water-stopping layer at lithographic step protects metal from etch-induced corrosions |
|
15:20 |
Douglas Guerrero |
Brewer Science |
Resist and Underlayer Roadmap for EUV Lithography |
|
15:45 |
Danilo De Simone |
imec |
A Lithographic and Etching Study on EUV Contact Hole Patterning for Stochastic Process Mitigation Towards Advanced Device Scaling |
|
16:10 |
Closure Remarks |
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|
Hands-On with Geert |
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|
Dinner & Networking |
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Please find a few nice memory shots from the workshop in 2021 here below.
Get ready for the hands-on in 2022!
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