FUJIFILM Workshop 2022

Fujifilm - Value from innovation

Looking ahead to the next event!

Fujifilm Electronic Materials would like to invite you to our Advanced Lithography Workshop 2022, which will take place on Thursday, 15 September 2022. As last year, it will be again an event in hybrid format, i.e. partially on-site and virtual. The venue for the on-site event will be in Dresden, Germany. We kindly ask you to mark that date in your calendar and will come back to you in the coming weeks with all relevant updates. Of course, we would be happy to see you presenting your resolved or unresolved challenges and findings. Please feel free to reserve a slot with us.

SAVE THE DATE:

Thu. 15 September 2022

EVENT VENUE:

Kunsthalle (neonworx)
Kraftwerk Mitte 5-7
01067 Dresden, Germany

Do you feel like registering? Please use our link to the registration engine.

With the current restrictions in place, we hope you understand that we have to maintain a very flexible event. While all our speakers have been nominated as of today, our agenda will continue to evolve to a more detailed list over the next few weeks. Thank you for your understanding and please check frequently!

TIME

SPEAKER

COMPANY

TITLE

13:00

FUJIFILM Workshop Team

FUJIFILM Electronic Materials

Introduction

SESSION 1 - Chaired by Christoph Hohle (Fraunhofer IPMS)

13:05

Michael Steiniger

Vishay Itzehoe

LTC 9320: Process Setup and Optimization

13:25

Niels Van Herck

FUJIFILM Electronic Materials

Enabling Polymers for Improved Resolution

13:45

Ksenija Varga

EV Group Europe

The Future of Lithography for Advanced Packaging is Digital

14:00

Audrey Berthoud

STMicroelectronics, Grenoble

New FUJIFILM resists qualification for smaller colored pixel RGB.

14:15

Hirotaka Takishita

FUJIFILM Electronic Materials

New Low-Reflectivity Black Material With High Optical Density

14:35

Break

SESSION 2 - Chaired by Sven Muehle (Globalfoundries)

15:00

Valentina Dall'Asta

STMicroelectronics, Agrate

Post-etch aluminum corrosions: the insertion of a water-stopping layer at lithographic step protects metal from etch-induced corrosions

15:20

Douglas Guerrero

Brewer Science

Resist and Underlayer Roadmap for EUV Lithography

15:45

Danilo De Simone

imec

A Lithographic and Etching Study on EUV Contact Hole Patterning for Stochastic Process Mitigation Towards Advanced Device Scaling

16:10

Closure Remarks

Hands-On with Geert

Dinner & Networking

Never stop imagining imaging!

Please find a few nice memory shots from the workshop in 2021 here below.

Get ready for the hands-on in 2022!

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